Japan's ASET group discloses EUV tool for 35-nm processes

Japan's ASET group discloses EUV tool for 35-nm processes
SANTA CLARA, Calif. -- During the SPIE Microlithography conference here, a Japanese R&D organization announced it has completed the development of a new alpha prototype tool based on extreme ultraviolet (EUV) technology. The EUV exposure system can be used to process integrated circuits at the 35-nm (0.035-micron) technology node, said the Association of Super-Advanced Electronics Technologies (ASET).

On Tuesday, the R&D group also said it was moving fall-speed ahead with an ambitious new program to develop of blank photomasks, metrology systems, resist technologies and laser sources for EUV lithography.

The moves represent ASET's latest efforts to bolster Japan's EUV technology in the worldwide race to develop a next-generation replacement for optical lithography. Late in 2001, ASET--which is backed by the government and private industry--formed a loosely organized entity within the organization to focus on EUV technology in Japan.

At that time, Canon Inc., Nikon Corp., and other Japanese companies joined the EUV group within ASET. The R&D organization itself develops key technologies, which are transferred to its member companies, according to officials from the organization.

Despite being members of the ASET consortium, Canon and Nikon are also separately developing their own EUV tools, according to the companies.

ASET has been involved with EUV for some time. Over two years ago, the organization developed its first EUV-enabled R&D tool for use in developing 70-nm devices.

Late last year, the consortium completed the development of a new, high-numerical apetature (NA) tool, based on EUV and geared for 35-nm wafer processing, said Shinji Okazaki, research manager for the EUV Lithography Laboratory for ASET, in a presentation at SPIE.

ASET has yet to report the results or images from its alpha tool, but the organization noted that it has no plans to commercialize the system. "We are doing pure research," he told SBN at the SPIE conference.

The organization is also moving into a new phase. ASET, along with its member companies, are not only developing an EUV-enabled tool, but also masks, resists, laser sources and metrology tools, he said.

In the group, lithography-tool rivals Canon and Nikon have teamed up to develop the metrology tools for EUV, according to Okazaki. Gigaphoton Inc., a joint venture between Komatsu and Ushio, is developing the laser source for EUV, he said.