News & Analysis
Sematech tips 450-mm fab, platform tool specs
Mark LaPedus
10/22/2009 7:08 PM EDT
AUSTIN, Texas -- Hoping to accelerate the possible migration to 450-mm prototype fabs by 2012, International Sematech has aggressively moved on several fronts.
The chip-making consortium has moved into the ''test wafer generation'' stage and installed the first tools in its 450-mm prototype clean room here, including metrology and wet-clean systems.
During a presentation here, it also outlined the preliminary specifications for a future 450-mm fab and revised its controversial concept of a ''platform tool'' for use in making chips in the arena.
A 450-mm platform tool would consist of three (or so) process chambers within a possible industry-standard chassis. The industry is expected to devise the platform guidelines by year's end, said Tom Jefferson, 450mm program manager for International Sematech.
Sematech is spearheading the 450-mm effort. As reported, Intel, TSMC and Samsung are separately pushing for the advent of 450-mm ''prototype'' fabs by 2012.
Sematech is targeting 450-mm ''demonstration'' tools for the 32-nm node and ''pilot tools'' at 22-nm. Some believe 450-mm fabs will never happen, saying the R&D costs are too expensive. No one is quite sure who will pay for the tools or the R&D.
In an interview after the presentation, Jefferson said he believes the industry can meet its target to devise prototype 450-mm fabs by 2012. ''Why not? We think it's possible,'' he said. "We've got three-plus years to go.''
One of the stumbling blocks are the equipment makers, many of which are resisting the move to 450-mm fabs. "Suppliers are working (on 450-mm),'' he said. "Some are more public than others. The fundamental question is: Who is going to pay for this?''
The Sematech manager, who is on assignment from Intel Corp., believes that 450-mm R&D will be paid for by a combination of both chip and equipment makers.
Still, the big question is clear: Are the equipment companies on board? The big players, including Applied, Novellus, Lam, TEL and others, have publicly slammed the idea of the 450-mm wafer transition. Most argue that the industry still can improve the efficiency of existing 300-mm fabs.
Most believe the 450-mm proponents--Intel, Samsung and TSMC--will push the tool makers towards the next-generation wafer size. Tool makers may have no choice: Intel, Samsung and TSMC represent a major percentage of the capital equipment buyers in the market.
''The equipment makers are less contentious than they were last year,'' said Scott Kramer, vice president of manufacturing at International Sematech.
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Mark LaPedus
10/30/2009 4:58 PM EDT
Do we really need 450-mm fabs or not? Is 300-mm good enough?
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