Shin-Etsu joins Sematech's 22-nm resist program

Shin-Etsu, one of the world's largest suppliers of semiconductor materials, will team with researchers at Sematech to develop and demonstrate advanced EUV photoresist for use at the 22 nm node and beyond.

"The cutting-edge research and development that is necessary for the commercialization of EUVL technology will be further enhanced by the addition of Shin-Etsu," said Richard Brilla, CNSE Vice President for Strategy, Alliances and Consortia, in a statement.

Sematech's RMDC will provide access to two micro-exposure tools (METs) located at the University at Albany's College of Nanoscale Science and Engineering and University of California at Berkeley, as well as several metrology tools.

More than 2,500 scientists, researchers, engineers, students, and faculty work on site at CNSE's Albany NanoTech, from companies including IBM, AMD, GlobalFoundries, Toshiba, Applied Materials, Tokyo Electron, ASML, Novellus Systems, Vistec Lithography, Atotech and Sematech.