News & Analysis
SOI and beyond
8/22/2003 5:25 PM EDT
SOI and beyond
Crafting wafer-scale strained silicon
Engineered substrates boost performance
Inside composite substrates
Silicon germanium challenges metrology
High-k strides reopen door to germanium
SOI and strained silicon complement each other
Non-Classical CMOS: the "Ultimate" MOSFET Device
CMOS scaling requires materials advances
The challenges facing CMOS scaling increase with each technology node, presenting materials
scientists, metrologists and process technologists with plenty of good work to do.
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