Tech Papers
Critical Failure ORC—Application to the 90-nm and 65-nm Nodes
Freescale Semiconductor, NXP, Mentor Graphics, STMicroelectronics
O. Toublan and Shumay Shang, Kyle Patterson, Y.Rody, Jerome Belledent, and Christophe Couderc, Corinne Miramond and Frank SundermannMentor Graphics Technical Library
April 2004
In this paper, we present a new technique (Critical Failure ORC or CF-ORC) to check the robustness of the structures created by OPC through the process window. The full methodology is explained and tested on a full chip at the 90-nm node. Improvements compared to standard ORC/MRC techniques will be presented on complex geometries. Finally, examples of concrete failure predictions are given and compared to experimental results.
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